Ryoichi Hirano

发表

Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013 .

Dependence of defect size and shape on detectability for EUV patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Advanced Lithography.

Recent results from EUVL patterned mask inspection using projection electron microscope system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Photomask Technology.

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2014, Photomask and Next Generation Lithography Mask Technology.

Investigation of defect detectability for extreme ultraviolet patterned mask using two types of high-throughput electron-beam inspection systems

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2015 .

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Advanced Lithography.

Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013 .

Mask blank particle inspection in vacuum environments

Ryoichi Hirano, Toru Tojo, Kiminobu Akeno, 2002, International Symposium on Optomechatronic Technologies.

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, SPIE Photomask Technology.

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Yoshitake Tsuji, Shingo Murakami, Kenichi Takahara, 2007, SPIE Advanced Lithography.

Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

Yasutaka Morikawa, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

Pattern shift error induced by coating and developing

Ryoichi Hirano, Toru Tojo, Shusuke Yoshitake, 1996, Photomask and Next Generation Lithography Mask Technology.

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014 .

A novel defect detection optical system using 199-nm light source for EUVL mask

Kenichi Takahara, Ryoichi Hirano, Nobutaka Kikuiri, 2010, Advanced Lithography.

Impact of B4C capping layer for extreme ultraviolet mask on the sensitivity of patterned mask inspection using a projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014 .

Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

Osamu Suga, Ryoichi Hirano, Tsuyoshi Amano, 2009, Photomask Technology.

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask Technology.

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Kenichi Takahara, Ryoichi Hirano, Nobutaka Kikuiri, 2010, Photomask Technology.

EUV patterned mask inspection system using a projection electron microscope technique

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask Technology.

Study on EUV mask defect inspection with hp 16nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics

Ryoichi Hirano, Hidehiro Watanabe, Masahiro Hatakeyama, 2016 .

Pattern inspection of etched multilayer extreme ultraviolet mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Adjustment method and apparatus

Ryoichi Hirano, Toshiya Umeda, Kyoichi Tatsuno, 1991 .

Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Development of novel projection electron microscopy (PEM) system for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, Photomask Japan.

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask and Next Generation Lithography Mask Technology.

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask and Next Generation Lithography Mask Technology.

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Kenichi Takahara, Ryoichi Hirano, Nobutaka Kikuiri, 2009, Advanced Lithography.

Study of EUV mask inspection using projection EB optics with programmed pattern defect

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Impact of B4C capping layer for EUV mask on the sensitivity of patterned mask inspection using projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask Technology.

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask and Next Generation Lithography Mask Technology.

Identification of multilayer structures using secondary electron yield curves: effect of native oxide films on EUV-patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016, SPIE Advanced Lithography.

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Osamu Suga, Kenichi Takahara, Kinya Usuda, 2009, Photomask Technology.

Impact of electron scattering in extreme ultraviolet reflective multilayer on electron image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Simulation technique for pattern inspection using a projection electron microscope

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, 2015 .

A dual grating alignment method insensitive to mask-wafer gap variation.

Ryoichi Hirano, Nobutaka Kikuiri, Yoriyuki Ishibashi, 1988 .

Analysis of image distortion on projection electron microscope image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2014 .

The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System.

Ryoichi Hirano, Munehiro Ogasawara, Toru Tojo, 1997 .

Pattern positioning error of reticle writing induced by reticle clamping

Ryoichi Hirano, Toru Tojo, Kazuto Matsuki, 1995 .

Evaluation of overlay accuracy for the x‐ray stepper TOXS‐1

Takeshi Nishizaka, Ryoichi Hirano, Hiroshi Nomura, 1994 .

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Screening of long-wavelength laser at high temperature and high current levels

Ryoichi Hirano, Hirofumi Namizaki, Wataru Susaki, 1983 .

An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects

Ryoichi Hirano, Susumu Iida, Kaoru Ohya, 2016 .

Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .

Residual-type mask defect printability for extreme ultraviolet lithography

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .