Hidehiro Watanabe

发表

Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013 .

Dependence of defect size and shape on detectability for EUV patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Advanced Lithography.

EUV actinic blank inspection: from prototype to production

Hidehiro Watanabe, Anna Tchikoulaeva, Hiroki Miyai, 2013, Advanced Lithography.

Experimental phase defect printability evaluation using a programmed phase defect in EUVL mask

Hidehiro Watanabe, Tsuyoshi Amano, Takeshi Yamane, 2013, Advanced Lithography.

Recent results from EUVL patterned mask inspection using projection electron microscope system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Photomask Technology.

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014 .

PMJ 2004 panel overview: Issues on mask technology for 65nm lithography with ArF

Hisashi Watanabe, Hidehiro Watanabe, 2004 .

Application of EUV dark field image for EUVL mask fabrication

Hidehiro Watanabe, Takeshi Yamane, 2017, Photomask Japan.

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014, Advanced Lithography.

Detection capability enhancement with a learning system for PEM mask inspection tool

Ryoichi Hirano, Hidehiro Watanabe, Masahiro Hatakeyama, 2015, SPIE Photomask Technology.

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2014, Photomask and Next Generation Lithography Mask Technology.

Investigation of defect detectability for extreme ultraviolet patterned mask using two types of high-throughput electron-beam inspection systems

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2015 .

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2013, Photomask Technology.

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Advanced Lithography.

Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013 .

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, SPIE Photomask Technology.

High performance photomask technology with the advanced binary film

Osamu Ikenaga, Hidehiro Watanabe, Kosuke Takai, 2010, Photomask Technology.

Phase defect printability analyses: dependence of defect type and EUV exposure condition

Hidehiro Watanabe, Takeshi Yamane, Tsuneo Terasawa, 2012, Advanced Lithography.

Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

Yasutaka Morikawa, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

Analysis of phase defect effect on contact hole pattern using a programmed phase defect in EUVL mask

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014, Advanced Lithography.

EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection

Noriaki Takagi, Hidehiro Watanabe, Rik Jonckheere, 2015, Other Conferences.

The capability of high magnification review function for EUV actinic blank inspection tool

Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori, 2013, Photomask and Next Generation Lithography Mask Technology.

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014 .

Higher current density operation with EB reticle writer EBM-5000

Hidehiro Watanabe, Masato Saito, Kunihiro Ugajin, 2006, Photomask Japan.

A novel side-wall transfer-transistor cell (SWATT cell) for multi-level NAND EEPROMs

Hidehiro Watanabe, Seiichi Aritome, Riichiro Shirota, 1995, Proceedings of International Electron Devices Meeting.

EUV actinic blank inspection tool with a high magnification review mode

Soichi Inoue, Tsuneo Terasawa, Hidehiro Watanabe, 2012, Other Conferences.

PMJ (Photomask Japan) 2004 panel overview: Issues on mask technology for 65-nm lithography with ArF

Hidehiro Watanabe, Hisashi Watanabe, 2004, SPIE Photomask Technology.

Impact of B4C capping layer for extreme ultraviolet mask on the sensitivity of patterned mask inspection using a projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014 .

Ultrafine mask cleaning technology using ultraviolet irradiation

Hidehiro Watanabe, Akio Kosaka, Kenji Masui, 1998, Photomask and Next Generation Lithography Mask Technology.

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask Technology.

257-nm wavelength mask inspection for 65-nm node reticles

Masami Ikeda, Hidehiro Watanabe, Satoshi Endo, 2004, Photomask Japan.

Defect analysis on actinic blank inspection tool

Hidehiro Watanabe, Ichiro Mori, Tomohiro Suzuki, 2014, Photomask and Next Generation Lithography Mask Technology.

The photomask technologies in hyper-NA lithography

Hidetoshi Ohnuma, Hidehiro Watanabe, 2005, SPIE Photomask Technology.

EUV patterned mask inspection system using a projection electron microscope technique

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask Technology.

Study on EUV mask defect inspection with hp 16nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Application of two-fluid nozzles for advanced photomask cleaning process

Mari Sakai, Hidehiro Watanabe, Tsutomu Kikuchi, 2008, Photomask Japan.

At wavelength observation of phase defect embedded in EUV mask using microscope technique

Hidehiro Watanabe, Tsuyoshi Amano, Takeo Watanabe, 2014, Advanced Lithography.

Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics

Ryoichi Hirano, Hidehiro Watanabe, Masahiro Hatakeyama, 2016 .

Pattern inspection of etched multilayer extreme ultraviolet mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Phase defect detection signal analysis: dependence of defect size variation

Hidehiro Watanabe, Tsuyoshi Amano, Tsukasa Abe, 2014, Photomask Technology.

Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask

Shigeki Nojima, Hidehiro Watanabe, Hisako Aoyama, 1997, Photomask and Next Generation Lithography Mask Technology.

1-nm of local CD accuracy for 45-nm-node photomask with low sensitivity CAR for e-beam writer

Osamu Ikenaga, Hidehiro Watanabe, Machiko Suenaga, 2007, Photomask Japan.

Study of extreme ultraviolet lithography patterned mask inspection tool for half-pitch 11-nm node defect detection performance

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

PMJ 2007 panel discussion overview: double exposure and double patterning for 32-nm half-pitch design node

Hidehiro Watanabe, Yoshinori Nagaoka, 2007, SPIE Photomask Technology.

More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products

Naoya Hayashi, Hideaki Sakurai, Mari Sakai, 2006, SPIE Photomask Technology.

Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Development of novel projection electron microscopy (PEM) system for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, Photomask Japan.

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask and Next Generation Lithography Mask Technology.

Impact of EUV mask roughness on lithography performance

Tsuneo Terasawa, Hidehiro Watanabe, Yukiyasu Arisawa, 2013, Advanced Lithography.

Advances in the detection capability on actinic blank inspection

Noriaki Takagi, Hidehiro Watanabe, Tsuyoshi Amano, 2016, SPIE Advanced Lithography.

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

Study of EUVL patterned mask inspection tool for half-pitch (hp) 16nm-11nm node

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Advanced Lithography.

Advantages of using the CAR for photomask manufacturing

Mari Sakai, Masamitsu Itoh, Hidehiro Watanabe, 2001, Photomask Japan.

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask and Next Generation Lithography Mask Technology.

Front Matter: Volume 6607

Hidehiro Watanabe, 2007 .

Study of EUV mask inspection using projection EB optics with programmed pattern defect

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Phase defect detection signal analysis: dependence of defect size variation

Hidehiro Watanabe, Tsuyoshi Amano, Tsukasa Abe, 2015 .

Impact of B4C capping layer for EUV mask on the sensitivity of patterned mask inspection using projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask Technology.

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask and Next Generation Lithography Mask Technology.

Identification of multilayer structures using secondary electron yield curves: effect of native oxide films on EUV-patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016, SPIE Advanced Lithography.

Photomask and Next-Generation Lithography Mask Technology XIV

Hidehiro Watanabe, Hidehiro Watanabe, 2007 .

Detection capability of Actinic Blank Inspection tool

Hidehiro Watanabe, Ichiro Mori, Tomohiro Suzuki, 2015, Other Conferences.