Susumu Iida

发表

Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013 .

Dependence of defect size and shape on detectability for EUV patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Advanced Lithography.

Recent results from EUVL patterned mask inspection using projection electron microscope system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Photomask Technology.

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2014, Photomask and Next Generation Lithography Mask Technology.

Investigation of defect detectability for extreme ultraviolet patterned mask using two types of high-throughput electron-beam inspection systems

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2015 .

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

Yasutaka Morikawa, Satoshi Tanaka, Shunko Magoshi, 2019, Advanced Lithography.

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Advanced Lithography.

Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013 .

Development of standard samples with programmed defects for evaluation of pattern inspection tools

Susumu Iida, Takayuki Uchiyama, Takamitsu Nagai, 2019, Advanced Lithography.

Risk evaluation method for fault displacements by engineering approach (6): Accident scenario and risk evaluation

Susumu Iida, Tadashi Narabayashi, Katsumi Ebisawa, 2017 .

Risk Evaluation Method for Fault Displacements by Engineering Approach: (4) Measures for Risk Reduction by Accident Management@@@（4）アクシデントマネジメントによるリスク低減

Susumu Iida, Masanobu Kamiya, Katsuya Kuroiwa, 2017 .

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, SPIE Photomask Technology.

Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Pattern inspection of etched multilayer EUV mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

Yasutaka Morikawa, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014 .

3B1 ROBUST ENERGY MANAGEMENT SYSTEM WITH ELECTRIC VEHICLES(Technical session 3B: Scheduling under uncertainty)

Shunji Umetani, Susumu Iida, Hiroshi Morita, 2011 .

Impact of B4C capping layer for extreme ultraviolet mask on the sensitivity of patterned mask inspection using a projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014 .

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask Technology.

EUV patterned mask inspection system using a projection electron microscope technique

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask Technology.

Study on EUV mask defect inspection with hp 16nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Pattern inspection of etched multilayer extreme ultraviolet mask

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Standard wafer with programed defects to evaluate the pattern inspection tools for 300-mm wafer fabrication for 7-nm node and beyond

Susumu Iida, Takayuki Uchiyama, Takamitsu Nagai, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Study of extreme ultraviolet lithography patterned mask inspection tool for half-pitch 11-nm node defect detection performance

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016 .

Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Other Conferences.

Development of novel projection electron microscopy (PEM) system for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, Photomask Japan.

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask and Next Generation Lithography Mask Technology.

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

Takeshi Murakami, Ryoichi Hirano, Hidehiro Watanabe, 2016, SPIE Advanced Lithography.

Study of EUVL patterned mask inspection tool for half-pitch (hp) 16nm-11nm node

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2015, Advanced Lithography.

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask and Next Generation Lithography Mask Technology.

Study of EUV mask inspection using projection EB optics with programmed pattern defect

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Impact of B4C capping layer for EUV mask on the sensitivity of patterned mask inspection using projection electron microscope

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2014, Photomask Technology.

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask and Next Generation Lithography Mask Technology.

Identification of multilayer structures using secondary electron yield curves: effect of native oxide films on EUV-patterned mask inspection

Ryoichi Hirano, Hidehiro Watanabe, Susumu Iida, 2016, SPIE Advanced Lithography.

Development of standard samples with programmed defects for evaluation of pattern inspection tools for 7-nm and smaller nodes

Susumu Iida, Takayuki Uchiyama, Takamitsu Nagai, 2019 .

Impact of electron scattering in extreme ultraviolet reflective multilayer on electron image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Simulation technique for pattern inspection using a projection electron microscope

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, 2015 .

Analysis of image distortion on projection electron microscope image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2014 .

Fabricating programmed micro-defects on a line and space pattern with an ultra-low line edge roughness <1 nm

Susumu Iida, Takayuki Uchiyama, T. Uchiyama, 2019, Micro and Nano Engineering.

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Optimized structure of standard sample with programed defects for pattern inspection using electron beams

Susumu Iida, Takayuki Uchiyama, 2018, Journal of Vacuum Science & Technology B.

An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects

Ryoichi Hirano, Susumu Iida, Kaoru Ohya, 2016 .

Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .

Residual-type mask defect printability for extreme ultraviolet lithography

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .