T. Lutz

发表

Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstrators

J. Kretz, W. Weber, L. Dreeskornfeld, 2005 .

Fabrication of a nano-scale NAND memory array based on a SONOS Fin-FET cell using e-beam lithography and hydrogen-silsesquioxane resist

J. Kretz, W. Weber, M. Specht, 2007 .

Influence of crystal orientation and body doping on trigate transistor performance

Michael Specht, Erhard Landgraf, Wolfgang Rösner, 2006 .

Integration of EBDW of one entire metal layer as substitution for optical lithography in 220nm node microcontrollers

C. Hohle, Johannes Kretz, K.-H. Choi, 2008 .