Jing Liu

Fabrication of 5-nm-Sized Nanodots Using Self-Assembly of Polystyrene–Poly(dimethylsiloxane)

S. Hosaka, M. Huda, Jing Liu, 2012 .

Long Range Ordering of 5-nm-Sized Dot Arrays with a Pitch of <10 nm along EB-Drawn Guide Lines Using PS-PDMS Self-Assembly

S. Hosaka, Yu Zhang, Hui Zhang, 2015 .

Attempts to form the 10-nm-order pitch of self-assembled nanodots using PS-PDMS block copolymer

S. Hosaka, Z. Mohamad, M. Huda, 2014 .

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF4 Etching with Carbon Hard Mask (CHM) as Mask

S. Hosaka, M. Huda, Zulfakri bin Mohamad, 2013 .

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

S. Hosaka, T. Komori, T. Akahane, 2013 .