G. Mollekopf

CO2 laser CVD of a-Si:H: in situ gas analysis and model calculations

F. Falk, H. Stafast, G. Mollekopf, 1998 .

CW CO2 laser CVD of amorphous hydrogenated silicon (a-Si:H): influence of the deposition geometry

H. Stafast, E. Golusda, R. Lange, 1992 .

CNx thin films prepared by laser chemical vapor deposition

F. Falk, H. Stafast, K. Schuster, 1997 .

SF6 sensitized CO2-laser chemical vapor deposition of a-Ge:H

M. Barth, P. Hess, H. Stafast, 1994 .

SF6 sensitized CO2 laser CVD of amorphous silicon

H. Stafast, E. Golusda, G. Mollekopf, 1993 .

On the role of the substrate position in the CO2 laser CVD of amorphous hydrogenated silicon

H. Stafast, E. Golusda, R. Lange, 1990 .