Toshio Doi

Advanced FIB mask repair technology for ArF lithography: III

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, 2001, Photomask Japan.

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, 2003, SPIE Photomask Technology.

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, 2003, Photomask Japan.

Advanced FIB mask repair technology for 100 nm/ArF lithography

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, 2001, Photomask Technology.

Advanced photomask repair technology for 65-nm lithography

Youichi Usui, Osamu Suga, Ryoji Hagiwara, 2006, SPIE Photomask Technology.

SDC cell-a novel CMOS/BiCMOS design methodology for mainframe arithmetic module generation

Toshio Doi, Koichiro Ishibashi, Mitsuo Asai, 1989, 1989 Proceedings of the IEEE Custom Integrated Circuits Conference.