H. W. Chen

NovelDiffusion Topography Engineering (DTE)forHighPerformance CMOS Applications

C. H. Ge, C. H. Ko, C. C. Chen, 2007 .

Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

Fu-Chien Chiu, H. W. Chen, Chuan-Hsi Liu, 2008 .

Interfacial and Electrical Characterization of HfO2-Gated MOSCs and MOSFETs by C-V and Gated-Diode Method

H. W. Chen, C. H. Chen, Chuan-Hsi Liu, 2008 .

Interface characterization and current conduction in HfO2-gated MOS capacitors

H. W. Chen, H. Hwang, P. Juan, 2008 .

Time dependent dielectric breakdown (TDDB) characteristics of metal-oxide-semiconductor capacitors with HfLaO and HfZrLaO ultra-thin gate dielectrics

H. W. Chen, C. H. Liu, H. Hsu, 2011, The 4th IEEE International NanoElectronics Conference.

Electrical characteristics and reliability properties of metal-oxide-semiconductor capacitors with HfZrLaO gate dielectrics

C. H. Liu, H. W. Chen, H. W. Chen, 2010, Microelectron. Reliab..

Impact of Hf content on positive bias temperature instability reliability of HfSiON gate dielectrics

C. H. Liu, H. W. Chen, H. W. Chen, 2010, Microelectron. Reliab..

Leakage current conduction behaviors of 0.65 nm equivalent-oxide-thickness HfZrLaO gate dielectrics

H. W. Chen, Chuan-Hsi Liu, H. Hsu, 2012 .