Tsutomu Shoki

发表

Development of low damage mask making process on EUV mask with thin CrN buffer layer

Hideo Kobayashi, Osamu Nagarekawa, Morio Hosoya, 2005, SPIE Advanced Lithography.

EUVL practical mask structure with light shield area for 32nm half pitch and beyond

Tadahiko Takikawa, Youichi Usui, Hajime Aoyama, 2008, Photomask Technology.

Recent performance of EUV mask blanks with low-thermal expansion glass substrates

Morio Hosoya, Hiroaki Shishido, Toshiyuki Sakamoto, 2007, SPIE Photomask Technology.

Amorphous stuctured Ta4B absorber on SiC membrane for x-ray mask

Franco Cerrina, Yoichi Yamaguchi, Ryo Ohkubo, 1995, Photomask and Next Generation Lithography Mask Technology.

Study on exposure contrast of an EUV mask

Takeru Kinoshita, Osamu Nagarekawa, Morio Hosoya, 2003, Photomask Japan.

Improvement of total quality on EUV mask blanks toward volume production

Minoru Sakamoto, Hideaki Mitsui, Masaru Mitsui, 2010, Advanced Lithography.

Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Tadahiko Takikawa, Youichi Usui, Yuusuke Tanaka, 2009, Photomask Technology.

EUV exposure experiment using programmed multilayer defects for refining printability simulation

Yuusuke Tanaka, Iwao Nishiyama, Takeo Hashimoto, 2007, SPIE Advanced Lithography.

Pattern inspection of EUV mask using an EUV microscope

Takeo Watanabe, Hiroo Kinoshita, Tsuneyuki Haga, 2003, Photomask Japan.

Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Iacopo Mochi, Sungmin Huh, Han-Ku Cho, 2011, Advanced Lithography.

Development of fiducial marks on EUV blanks for defect mitigation process

Tsutomu Shoki, Osamu Maruyama, Kazuhiro Hamamoto, 2012, Advanced Lithography.

Process development for EUV mask production

Naoya Hayashi, Hiroshi Mohri, Shiho Sasaki, 2006, SPIE Photomask Technology.

Process development of 6-in EUV mask with TaBN absorber

Youichi Usui, Takeru Kinoshita, Hideo Kobayashi, 2002, Photomask Japan.

Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness

Jin Choi, Roxann L. Engelstad, Jaewoong Sohn, 2009, Photomask Japan.

Phase defect observation using an EUV microscope

Takeo Watanabe, Hiroo Kinoshita, Morio Hosoya, 2006, SPIE Advanced Lithography.

Fabrication of programmed phase defects on EUV multilayer blanks

Takeru Kinoshita, Hideo Kobayashi, Osamu Nagarekawa, 2003, SPIE Photomask Technology.

Improvement of defects and flatness on extreme ultraviolet mask blanks

Minoru Sakamoto, Osamu Maruyama, Tsutomu Shoki, 2013 .

Study of SiC x-ray mask distortion induced by backetching receding subtractive fabrication process

Yoichi Yamaguchi, Shinji Tsuboi, Ryo Ohkubo, 1995, Photomask and Next Generation Lithography Mask Technology.

Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes

Hiroo Kinoshita, Tsutomu Shoki, Noriyuki Sakaya, 2005 .

Direct evaluation of surface roughness of substrate and interfacial roughness in molybdenum/silicon multilayers using extreme ultraviolet reflectometer

Hiroo Kinoshita, Osamu Nozawa, Morio Hosoya, 2007 .

Fine Pattern Replication by EUV Lithography

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2001 .

Damage-free extreme ultraviolet mask with TaBN absorber

Takeru Kinoshita, Osamu Nagarekawa, Morio Hosoya, 2003 .

Effect of anodic bonding temperature on mechanical distortion of SiC X-ray mask substrate

Hiroyuki Nagasawa, Tsutomu Shoki, Yoh-ichi Yamaguchi, 1992 .

Evaluating the Optical Index of Ta and Ta-Based Absorbers for an Extreme Ultraviolet Mask Using Extreme Ultraviolet Reflectometry

Hiroo Kinoshita, Osamu Nozawa, Osamu Nagarekawa, 2008 .

Accelerated radiation damage studies of antireflection materials on SiC x‐ray mask membrane

Franco Cerrina, Ryo Ohkubo, Tsutomu Shoki, 1994 .

Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU

Hiroo Kinoshita, Tsutomu Shoki, Noriyuki Sakaya, 2005 .

Properties Of SiC Film As X-Ray Mask Membrane

Isao Amemiya, Osamu Nagarekawa, Hiroyuki Nagasawa, 1993 .

Mask defect inspection using an extreme ultraviolet microscope

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2005 .

Investigation of Contamination Removal from Finished EUVL Mask

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2003 .

Actinic mask metrology for extreme ultraviolet lithography

Masayuki Endo, Hiroo Kinoshita, Tsuneyuki Haga, 2004 .