P. Rodriguez

Impact of the pre amorphization by Ge implantation on Ni0.9Pt0.1 silicide

S. Joblot, A. Papon, D. Mangelinck, 2021, Microelectronic Engineering.

Ni(Pt)-based CMOS-compatible contacts on p-InGaAs for III–V photonic devices

Q. Rafhay, C. Jany, P. Gergaud, 2023, Materials Science in Semiconductor Processing.

Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction

J. Hartmann, D. Mariolle, V. Loup, 2022, Microelectronic Engineering.

Ni-based metallization of GeSn layers: A review and recent advances

J. Hartmann, V. Reboud, P. Gergaud, 2023, Microelectronic Engineering.

Impact of Si/Al implantation on the forming voltage and pre-forming conduction modes in HfO2 based OxRAM cells

Laurent Grenouillet, Elisa Vianello, E. Jalaguier, 2016, 2016 46th European Solid-State Device Research Conference (ESSDERC).