J. M. Hartmann

Multiple wavelength silicon photonic 200 mm R+D platform for 25Gb/s and above applications

B. Szelag, B. Blampey, T. Ferrotti, 2016, Photonics Europe.

Ultra-high amplified strain on 200 mm optical Germanium-On-Insulator (GeOI) substrates: towards CMOS compatible Ge lasers

D. Fowler, J. M. Hartmann, J. Widiez, 2016, SPIE OPTO.

Ge/SiGe photonic devices for the long mid-infrared

J. M. Hartmann, P. Labeye, M. Fournier, 2018, Photonics Europe.

(Si)GeSn nanostructures for light emitters

J. M. Hartmann, C. Schulte-Braucks, Z. Ikonic, 2016, Photonics Europe.

Inductively coupled plasma etching of germanium tin for the fabrication of photonic components

J. Rothman, V. Reboud, J. M. Hartmann, 2017, OPTO.