H. Kobayashi

发表

Thermal-cyclic atomic layer etching of cobalt with smooth etched surface by plasma oxidation and organometallization

H. Hamamura, M. Izawa, Hiroyuki Kobayashi, 2022, Applied Physics Letters.

Study of Si Etch Rate in Various Composition of SC1 Solution

J. Ryuta, Hiroyuki Kobayashi, H. Kobayashi, 1993 .

Behavior of Dust Particles in Plasma Etching Apparatus

H. Kobayashi, 2011 .

Reducing Particle Contamination During Pump-down in Load Lock Chamber

H. Kobayashi, 2010 .

Investigation of particle reduction and its transport mechanism in UHF-ECR dielectric etching system

K. Yokogawa, K. Maeda, M. Izawa, 2008 .

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

M. Hori, K. Ishikawa, Nobuya Miyoshi, 2019, Journal of Physics D: Applied Physics.

Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Hiroyuki Kobayashi, Nobuya Miyoshi, Masaru Izawa, 2017 .

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

Kenji Maeda, Masaru Hori, Hiroyuki Kobayashi, 2017 .

Measurement of Rotational Populations of CH Radicals in Low-Temperature Plasmas

S. Kado, B. Xiao, S. Tanaka, 2003 .