Takayuki Katsunuma

EUV resist curing technique for LWR reduction and etch selectivity enhancement

Koichi Yatsuda, Masanobu Honda, Kazuki Narishige, 2012, Advanced Lithography.

Integrated atomic scale CD control and local variability reduction techniques

Masanobu Honda, Takayuki Katsunuma, Toru Hisamatsu, 2019, Advanced Lithography.

Novel etch technologies utilizing atomic layer process for advanced patterning

Masanobu Honda, Takayuki Katsunuma, Toru Hisamatsu, 2020, Advanced Lithography.

(Invited) Plasma-Enhanced Quasi-ALE and ALD Processing for Leading-Edge Microfabrication

Shuhei Ogawa, Masanobu Honda, Takayuki Katsunuma, 2016 .