Scott D. Allen

Hardmask technology for sub-100 nm lithographic imaging

Scott Halle, Timothy A. Brunner, Marie Angelopoulos, 2003, SPIE Advanced Lithography.

Silicon containing polymer in applications for 193 nm high NA lithography processes

Karen Petrillo, Allen H. Gabor, Naftali E. Lustig, 2006, SPIE Advanced Lithography.

Impact of thin resist processes on post-etch LER

Hiroshi Ito, Martha I. Sanchez, Gregory M. Wallraff, 2003, SPIE Advanced Lithography.

32 nm logic patterning options with immersion lithography

Zachary Baum, Scott Halle, Vito Dai, 2008, SPIE Advanced Lithography.

Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Scott Halle, Marie Angelopoulos, Karen Petrillo, 2003, SPIE Advanced Lithography.

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Gregg M. Gallatin, Dario L. Goldfarb, Marie Angelopoulos, 2004 .

Efficient Synthesis of 4,5,9,10-Tetrahydropyrene: A Useful Synthetic Intermediate for the Synthesis of 2,7-Disubstituted Pyrenes.

Scott D. Allen, David M. Collard, C. Liotta, 1999, The Journal of organic chemistry.