Kiho Baik

发表

Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer

Hyeongsoo Kim, J. Jung, Kiho Baik, 1999 .

Lithographic Performances of Non-Chemically Amplified Resist and Chemically Amplified Resist for 193nm Top Surface Imaging Process

Ki-Ho Baik, Cha-Won Koh, C. Koh, 2000 .

Amine gradient process for DUV lithography

Ki-Ho Baik, J. Jung, Min-Ho Jung, 2001 .

Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214ETM

M. Hatzakis, E. Gogolides, L. V. Hove, 1994 .

Effect of pattern density for contact windows in an attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Il-Ho Lee, 1995, Advanced Lithography.

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2008, Photomask Technology.

Real time monitoring of reticle etch process tool to investigate and predict critical dimension performance

Ki-Ho Baik, Frank E. Abboud, Karmen Yung, 2007, SPIE Advanced Lithography.

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.

CD and profile metrology of embedded phase shift masks using scatterometry

Ki-Ho Baik, Sanjay Yedur, Kyung M. Lee, 2006, European Mask and Lithography Conference.