Robin Chao

Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

Nelson Felix, Raja Muthinti, Cornel Bozdog, 2016, SPIE Advanced Lithography.

Bias Temperature Instability Reliability in Stacked Gate-All-Around Nanosheet Transistor

Xin Miao, James H. Stathis, Tenko Yamashita, 2019, 2019 IEEE International Reliability Physics Symposium (IRPS).

Towards electrical testable SOI devices using Directed Self-Assembly for fin formation

Akiteru Ko, Hong He, Nihar Mohanty, 2014, Advanced Lithography.

Channel Geometry Impact and Narrow Sheet Effect of Stacked Nanosheet

Nicolas Loubet, Tenko Yamashita, Miaomiao Wang, 2018, 2018 IEEE International Electron Devices Meeting (IEDM).

High-k metal gate fundamental learning and multi-Vt options for stacked nanosheet gate-all-around transistor

Nicolas Loubet, Tenko Yamashita, Sivananda Kanakasabapathy, 2017, 2017 IEEE International Electron Devices Meeting (IEDM).