Mark Klare

Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

Nelson Felix, Raja Muthinti, Cornel Bozdog, 2016, SPIE Advanced Lithography.

XPS-XRF hybrid metrology enabling FDSOI process

Ying Wang, Alok Vaid, Mainul Hossain, 2016, SPIE Advanced Lithography.

Hybrid enabled thin film metrology using XPS and optical

Alok Vaid, Prasad Dasari, Cornel Bozdog, 2016, SPIE Advanced Lithography.

Full structure transistor process monitoring of boron and germanium in PFET EPI using in-line XPS

Jusang Lee, Mark Klare, Ganesh Subramanian, 2019, Advanced Lithography.

Silicon-Germanium (SiGe) composition and thickness determination via simultaneous smallspot XPS and XRF measurements

Nicolas Loubet, Romain Wacquez, John Gaudiello, 2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).