Gerard Luk-Pat

A high-performance triple patterning layout decomposer with balanced density

David Z. Pan, Bei Yu, Yen-Hung Lin, 2013, 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD).

Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2009 .

Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Yuelin Du, Martin D. F. Wong, Qiang Ma, 2013, 2013 50th ACM/EDAC/IEEE Design Automation Conference (DAC).