C. H. Huang

Process solutions for reducing PR residue over non-planar wafer

Chih-Yuan Lu, Elvis Yang, K. C. Chen, 2011, Advanced Lithography.

Reducing the substrate dependent scanner leveling effect in low-k1 contact printing

Elvis Yang, T. H. Yang, K. C. Chen, 2015, Advanced Lithography.

PEB to development delay influence on contact patterning by negative tone development process

Chih-Yuan Lu, Elvis Yang, T. H. Yang, 2013, Advanced Lithography.