Kenichi Yasui

GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Noriaki Nakayamada, Yukihiro Masuda, Aki Fujimura, 2017, Photomask Japan.

Controlling linewidth roughness in step and flash imprint lithography

Hideo Kobayashi, Naoya Hayashi, Mary Beth Rothwell, 2008, European Mask and Lithography Conference.

The development of full field high resolution imprint templates

Hideo Kobayashi, Takashi Sato, Hitoshi Sunaoshi, 2007, SPIE Photomask Technology.

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Geert Vandenberghe, Bruce W. Smith, Yuri Granik, 2009 .

Proposal of a new data format for multibeam mask writer with curve expression

Noriaki Nakayamada, Patrick Schiavone, Thiago Figueiro, 2019 .