Makoto Sekine

发表

Novel diffraction gratings fabricated by means of plasma nanotechnologies

A. Bianco, M. Hori, N. Ebizuka, 2012, Other Conferences.

Clarification of a SiOF layer formed on SiO2 under fluorocarbon plasma etching

Masaru Hori, Makoto Sekine, Yoshinobu Ohya, 2015 .

11th Asia-Pacific Conference on Plasma Science and Technology (APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)

Toshio Kaneko, Makoto Sekine, Takayuki Watanabe, 2013 .

Effect of transient behavior of pulse modulated inductively coupled plasma on photon-induced interface defects

Masaru Hori, Makoto Sekine, Kenji Ishikawa, 2015 .

Chip-Level Performance Maximization Using ASIS (Application-Specific Interconnect Structure) Wiring Design Concept for 45 nm CMOS Generation

Yoshihiro Hayashi, Kenta Yamada, Kazuyoshi Ueno, 2007, IEICE Trans. Electron..

Rapid precise measurements of film-covered-substrate temperatures during plasma processes

Masafumi Ito, Masaru Hori, Makoto Sekine, 2013 .

Control of surface reactions in high-performance SiO2 etching

Miyako Matsui, Makoto Sekine, Tetsuya Tatsumi, 2000 .

Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4

Miyako Matsui, Makoto Sekine, Tetsuya Tatsumi, 2001 .

Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

Masaru Hori, Mineo Hiramatsu, Makoto Sekine, 2017 .

Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar+ Beam with Hydrogen and Fluorocarbon Radical Injection

Masaru Hori, Mineo Hiramatsu, Makoto Sekine, 2010 .

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching

Masafumi Ito, Masaru Hori, Makoto Sekine, 2015, IEEE Transactions on Semiconductor Manufacturing.

Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma

Masaru Hori, Hiroyuki Kano, Makoto Sekine, 2012 .

Study for plasma etching of dielectric film in semiconductor device manufacturing. Review of ASET research project

Makoto Sekine, M. Sekine, 2002 .

Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

Chishio Koshimizu, Masaru Hori, Makoto Sekine, 2012 .

Single-Crystal Silicon Etching Characteristics Using Excimer Laser Cℓ 2 GAS

Makoto Sekine, Tsunetoshi Arikado, Yasuhiro Horiike, 1983 .