Jean-Pierre Panabiere

Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source

Andre P. Weill, Jean-Marc Francou, Jean-Pierre Panabiere, 1988, Advanced Lithography.

Comparative evaluation of e-beam charge reducing processes

Gilles R. Amblard, André Weill, Frederic P. Lalanne, 1992, Advanced Lithography.

New dry-development process of trilayer resist systems for advanced lithography

Francoise Vinet, Jean-Pierre Panabiere, Serge V. Tedesco, 1993, Other Conferences.

Charge effect elimination for automatic CD inspection of 0.4-μm contact holes in resist

Sandrine Andre, Andre P. Weill, Jean-Pierre Panabiere, 1995, Advanced Lithography.

CVD photoresist performance for 248-nm lithography

Cedric Monget, Timothy W. Weidman, Olivier Toublan, 1999, Advanced Lithography.

Wet-developed, high-aspect-ratio resist patterns by 20-keV e-beam lithography

Gilles R. Amblard, André Weill, Frederic P. Lalanne, 1991, Other Conferences.