Peter Peng

Seismic Analyses of Telecommunications Equipment

Ronald D. Ziemian, Scott Prestridge, Peter Peng, 1995 .

A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask

James Cheng, Aditya Dayal, Yung-Feng Cheng, 2007, Photomask Japan.

Automatic optimization of MEEF-driven defect disposition for contamination inspection challenges

James Cheng, Aditya Dayal, Yung-Feng Cheng, 2007, SPIE Photomask Technology.

Predictive chrome-film haze mask management for mass production

Peter Peng, Xiaosong Zhang, Jeffrey Sim, 2010, Advanced Lithography.