H. Megens

Bright thermal atomic beams by laser cooling: A 1400-fold gain in beam flux

E. Vredenbregt, M. Hoogerland, J. Driessen, 1996 .

A factor 1600 increase in neutral atomic beam intensity using laser cooling

E. Vredenbregt, M. Hoogerland, J. Driessen, 1994, Proceedings of IEEE 48th Annual Symposium on Frequency Control.

Pure state Ne*(*) [ J,M>]-preparation in a magnetic field : polarization effects in ionizing collisions

B. Verhaar, J. Driessen, H. Beijerinck, 1990 .

Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models

Sudhar Raghunathan, Jan Hermans, Robert Socha, 2018, Advanced Lithography.

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, Hannah Wei, Michael Hanna, 2015, Advanced Lithography.

Lithographic scanner stability improvements through advanced metrology and control

Peter Vanoppen, Timon Fliervoet, Martin Ebert, 2010, Advanced Lithography.