M. Imai

Fundamental study of air flow effects on liquid removal from wafer surface

A. Fukunaga, K. Amagai, Satomi Hamada, 2014, Proceedings of International Conference on Planarization/CMP Technology 2014.

Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool

Kazuo Nakajima, Marc Heyns, Rita Vos, 2003 .