Hanyou Chu

Finite difference algorithm in real-time optical CD applications

Jon Opsal, Hanyou Chu, Jingmin Leng, 2004, SPIE Advanced Lithography.

Fundamental solutions for real-time optical CD metrology

Yia-Chung Chang, Youxian Wen, Hanyou Chu, 2002, SPIE Advanced Lithography.

Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology

Yia-Chung Chang, Jon Opsal, Guangwei Li, 2004, SPIE Advanced Lithography.

Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Jon Opsal, Youxian Wen, Won D. Kim, 2005, SPIE Advanced Lithography.

Contact hole inspection by real-time optical CD metrology

Yia-Chung Chang, Guangwei Li, Youxian Wen, 2003, SPIE Advanced Lithography.

Finite difference approach to optical scattering of gratings

Hanyou Chu, H. Chu, 2003, SPIE Optics + Photonics.

Analytic representations of the dielectric functions of materials for device and structural modeling

Jon Opsal, M. Senko, David E. Aspnes, 1998 .

Efficient finite-element, Green's function approach for critical-dimension metrology of three-dimensional gratings on multilayer films.

Yia-Chung Chang, Jon Opsal, Guangwei Li, 2006, Journal of the Optical Society of America. A, Optics, image science, and vision.