Y. Shin

Advanced technologies for UHD curved OLED TV

Chang‐ho Oh, Soo‐Youle Cha, Moojong Lim, 2014 .

Ta-Si-N as a diffusion barrier between Cu and Si

Chongmu Lee, Y. Shin, 1998 .

Diffusion barrier property of TiN and TiN/Al/TiN films deposited with FMCVD for Cu interconnection in ULSI

Y. Shimogaki, Y. Shin, 2004 .

53.2: Invited Paper: Advanced Technologies for Large-sized OLED TV

Byung-Chul Ahn, Moojong Lim, Yoon-Heung Tak, 2014 .

60‐3: Study on the Efficiency Improvement of OLED TVs with High Transmittance Technology of the Polarizer

Seong Han Hwang, Chang‐ho Oh, Hyunjong Noh, 2019, SID Symposium Digest of Technical Papers.

Chemical Vapor Deposition of TiAlN film by Using Titanium Tetrachloride, Dimethylethylamine Alane and Ammonia Gas for ULSI Cu Diffusion Barrier Application

Y. Shimogaki, Y. Shin, 2004 .