John S. Villarrubia

10nm three-dimensional CD-SEM metrology

Bin Ming, András E. Vladár, John S. Villarrubia, 2014, Advanced Lithography.

Proximity-associated errors in contour metrology

Ronald G. Dixson, András E. Vladár, John S. Villarrubia, 2010, Advanced Lithography.

Dimensional metrology of resist lines using a SEM model-based library approach

John S. Villarrubia, Andras E. Vladar, Michael Bishop, 2004, SPIE Advanced Lithography.

Can we get 3D-CD metrology right?

András E. Vladár, John S. Villarrubia, Michael T. Postek, 2012, Advanced Lithography.

Accurate and traceable dimensional metrology with a reference CD-SEM

András E. Vladár, John S. Villarrubia, Michael T. Postek, 2008, SPIE Advanced Lithography.