Gregory Breyta

发表

Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Will Conley, Gregory Breyta, William R. Brunsvold, 1996, Advanced Lithography.

The effect of photoresist/topcoat properties on defect formation in immersion lithography

Gregory Breyta, Gregory M. Wallraff, Karen Petrillo, 2006, SPIE Advanced Lithography.

High-resolution 248-nm bilayer resist

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

Role of photoacid structure on the performance of 193-nm resists

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1997, Advanced Lithography.

Aliphatic platforms for the design of 157-nm chemically amplified resists

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2002, SPIE Advanced Lithography.

Polymer-platform-dependent characteristics of 193-nm photoresists

Gregory Breyta, Christopher K. Ober, Robert D. Allen, 1999, Advanced Lithography.

Influence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization

Gregory Breyta, Hiroshi Ito, Donald C. Hofer, 1995, Advanced Lithography.

Characterization of new aromatic polymers for 157-nm photoresist applications

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Breyta, Martha I. Sanchez, Gregory M. Wallraff, 1999, Advanced Lithography.

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, Gregory Breyta, William R. Brunsvold, 1997, Advanced Lithography.

Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Gregory Breyta, Hiroshi Ito, Azalia A. Krasnoperova, 1997, Advanced Lithography.

Polymer design for 157-nm chemically amplified resists

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

193-nm negative resist based on acid-catalyzed elimination of polar molecules

Gregory Breyta, Thomas I. Wallow, Phillip J. Brock, 2004, SPIE Advanced Lithography.

Sensitivity factors of CAR electron-beam resists

Gregory Breyta, David R. Medeiros, Karen Petrillo, 2002, SPIE Advanced Lithography.

PHS with inert blocking groups for DUV negative resist

Will Conley, Gregory Breyta, William R. Brunsvold, 1997, Advanced Lithography.

Method of comparing chemical contrast with resist contrast

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 1996, Advanced Lithography.

Dissolution behavior of phenolic resins and resists as studied by quartz crystal microbalance

Gregory Breyta, Hiroshi Ito, Debra Fenzel-Alexander, 1997, Advanced Lithography.

Approaches to etch-resistant 193-nm photoresists: performance and prospects

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

Molecular design for stabilization of chemical amplification resist toward airborne contamination

Gregory Breyta, Hiroshi Ito, William D. Hinsberg, 1993, Advanced Lithography.

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

Gregory Breyta, Martha I. Sanchez, Gregory M. Wallraff, 2000, Advanced Lithography.

Protecting groups for 193-nm photoresists

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1996, Advanced Lithography.

Optimization of ESCAP photoresist for x-ray lithography

Gregory Breyta, Donald C. Hofer, Hiroshi Ito, 1994, Advanced Lithography.

Polymer self assembly in semiconductor microelectronics

Ying Zhang, Gregory Breyta, Charles T. Black, 2006, 2006 International Electron Devices Meeting.

Experimental realization of order-finding with a quantum computer

Gregory Breyta, Isaac L. Chuang, Isaac L. Chuang, 2000 .

APPROACH TOWARD ENVIRONMENTAL STABILIZATION OF CHEMICAL AMPLIFICATION RESISTS

Gregory Breyta, Hiroshi Ito, William D. Hinsberg, 1993 .

Single-layer chemically amplified photoresists for 193-nm lithography

Gregory Breyta, Roderick R. Kunz, Gregory M. Wallraff, 1993 .

Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography

Gregory Breyta, Linda K. Sundberg, Daniel P. Sanders, 2006 .

The Influence of Photoacid Structure on the Design and Performance of 193-nm Resists

Gregory Breyta, Donald C. Hofer, Thomas I. Wallow, 1997 .