Hiroshi Ito

发表

Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Will Conley, Gregory Breyta, William R. Brunsvold, 1996, Advanced Lithography.

Positive/Negative Mid Uv Resists With High Thermal Stability

Hiroshi Ito, C. G. Wilson, Jean M. Frechet, 1987, Advanced Lithography.

Study of matching load on nonuniform coaxial transmission line and its application to wideband impedance transformer

Hiroshi Ito, Seigo Sano, Manabu Mochizuki, 1987 .

Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Hiroshi Ito, Vivek M. Prabhu, Michael X. Wang, 2004, SPIE Advanced Lithography.

New phase-shifting mask with highly transparent SiO2 phase shifters

Hiroshi Ito, Isamu Hanyu, Satoru Asai, 1990, Advanced Lithography.

Rational design in cyclic olefin resists for sub-100-nm lithography

Hiroshi Ito, Hoa D. Truong, Robert D. Allen, 2003, SPIE Advanced Lithography.

Postmodification as a way to improve the lithographic performance of resist materials

Hiroshi Ito, George M. Jordhamo, Robert D. Allen, 2001, SPIE Advanced Lithography.

Aqueous Base Developable Deep UV Resist Systems Based On Novel Monomeric And Polymeric Dissolution Inhibitors

Hiroshi Ito, 1988, Advanced Lithography.

SCFL static frequency divider using InAIAs/InGaAs/InP HEMTs

Hiroshi Ito, Takatomo Enoki, Yohtaro Umeda, 1995, 1995 25th European Microwave Conference.

Chemically amplified resists: past, present, and future

Hiroshi Ito, 1999, Advanced Lithography.

High-contrast positive resists for e-beam mask making

Hiroshi Ito, Marie Angelopoulos, Karen Petrillo, 1998, Photomask Technology.

Aliphatic platforms for the design of 157-nm chemically amplified resists

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2002, SPIE Advanced Lithography.

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

William R. Brunsvold, Hiroshi Ito, Thomas I. Wallow, 2000, Advanced Lithography.

Reflection-Geometry Measurements of Biological Materials Using Photonically Generated Millimeter Waves

Hiroshi Ito, Hiroshi Yamamoto, 2013, IEICE Trans. Electron..

Influence of polymer properties on airborne chemical contamination of chemically amplified resists

Hiroshi Ito, William D. Hinsberg, Nicholas J. Clecak, 1993, Advanced Lithography.

Millimeter-Wave Ellipsometry Using Low-Coherence Light Source

Hiroshi Ito, Hiroshi Yamamoto, Hiroshi Ito, 2014, IEICE Trans. Electron..

Characterization of new aromatic polymers for 157-nm photoresist applications

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

Sensitive Electron Beam Resist Systems Based On Acid-Catalyzed Deprotection

Hiroshi Ito, Kaolin N. Chiong, Lester A. Pederson, 1989, Advanced Lithography.

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 1999, Advanced Lithography.

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, Gregory Breyta, William R. Brunsvold, 1997, Advanced Lithography.

Hybrid resist systems based on α-substituted acrylate copolymers

Hiroshi Ito, Linda K. Sundberg, Masaki Fujiwara, 2009, Advanced Lithography.

Photonic terahertz-wave generation using uni-traveling-carrier photodiodes

Hiroshi Ito, 2006, SPIE Optics East.

Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Gregory Breyta, Hiroshi Ito, Azalia A. Krasnoperova, 1997, Advanced Lithography.

Desiccation of biological tissue measured by photonic millimeter-wave ellipsometry

Makoto Noshiro, Hiroshi Ito, Hiroshi Yamamoto, 2012, IEICE Electron. Express.

Polymer design for 157-nm chemically amplified resists

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

NMR analysis of chemically amplified resist films

Hiroshi Ito, Mark H. Sherwood, 1999, Advanced Lithography.

Flat image display panel and manufacturing processes

Hiroshi Ito, Atsushi Ito, Hironobu Arimoto, 1998 .

Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base

Hiroshi Ito, William D. Hinsberg, Seok-Won Lee, 2001, SPIE Advanced Lithography.

Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

Hiroshi Ito, Vivek M. Prabhu, Erin L. Jablonski, 2004, SPIE Advanced Lithography.

Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)

Hiroshi Ito, Thomas I. Wallow, George M. Jordhamo, 1999, Advanced Lithography.

Method of comparing chemical contrast with resist contrast

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 1996, Advanced Lithography.

Lactones in 193 nm resists: What do they do?

Hiroshi Ito, Hoa D. Truong, P. J. Brock, 2008, SPIE Advanced Lithography.

Impact of thin resist processes on post-etch LER

Hiroshi Ito, Martha I. Sanchez, Gregory M. Wallraff, 2003, SPIE Advanced Lithography.

Less Invasive Method for Accurate CMRglc Measurement

Hiroshi Ito, Hiroshi Fukuda, Ryuta Kawashima, 1994 .

Millimeter-Wave Ellipsometry Using Interface-Planarization Prism

Hiroshi Ito, Hiroshi Yamamoto, 2015, IEICE Trans. Electron..

Dissolution behavior of phenolic resins and resists as studied by quartz crystal microbalance

Gregory Breyta, Hiroshi Ito, Debra Fenzel-Alexander, 1997, Advanced Lithography.

Approaches to etch-resistant 193-nm photoresists: performance and prospects

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

The Development of the Totalized Hydrogen Energy Utilization System for Commercial Buildings

Hiroshi Ito, Atsushi Kato, Tetsuhiko Maeda, 2011 .

Molecular design for stabilization of chemical amplification resist toward airborne contamination

Gregory Breyta, Hiroshi Ito, William D. Hinsberg, 1993, Advanced Lithography.

Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law

Hiroshi Ito, 2008, SPIE Advanced Lithography.

Manufacturing technique of large-area optical elements with micro/nano structures on both surfaces

Hiroshi Ito, Hiroshi Owari, Kazuya Yamamoto, 2014, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

B33 Measurement and Analysis of Mastication Muscle Sound by Using Condenser Microphone

Hiroshi Ito, Masaki Hokari, Russyazila, 2008 .

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 2000, Advanced Lithography.

Self-segregating materials for immersion lithography

Hiroshi Ito, Phillip J. Brock, Hoa D. Truong, 2008, SPIE Advanced Lithography.

InP/InGaAs Uni-Traveling-Carrier Photodiodes

Hiroshi Ito, Tadao Nagatsuma, Naofumi Shimizu, 2000 .

193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries

William R. Brunsvold, Hiroshi Ito, Hiroyuki Ishii, 2001, SPIE Advanced Lithography.

The thermal performance by future forecast model of glass facade buildings

Hiroshi Ito, Shinichi Tanabe, Jeongsoo Kim, 2009 .

Reliability scaling in deep submicron MOSFETs

Hiroshi Ito, Tadahiko Horiuchi, Naohiko Kimizuka, 1996, Advanced Lithography.

Millimeter-wave ellipsometry of human skin based on photonics technology

Makoto Noshiro, Hiroshi Ito, Hiroshi Yamamoto, 2010, IEICE Electron. Express.

Measurement and Analysis of Mastication Muscle Sound by Using Condenser Microphone

Hiroshi Ito, Masaki Hokari, 2008 .

Interfacial structure of photoresist thin films in developer solutions

Hiroshi Ito, Vivek M. Prabhu, Bryan D. Vogt, 2005, SPIE Advanced Lithography.

Development of Super High Definition Monitor with Wide Color Gamut

Hiroshi Ito, Kenichi Iwauchi, Kei Tokui, 2003 .

Optimization of ESCAP photoresist for x-ray lithography

Gregory Breyta, Donald C. Hofer, Hiroshi Ito, 1994, Advanced Lithography.

Compaction properties of granular bentonites

Hiroshi Ito, 2006 .

LITHOGRAPHIC FEASIBILITY OF ESCAP BEYOND QUARTER MICRON

Will Conley, Hiroshi Ito, Debra Fenzel-Alexander, 1996 .

A Sensitive, Etch Resistant, Positive Tone E‐Beam Resist System

Hiroshi Ito, Scott A. MacDonald, Carlton G Willson, 1988 .

APPROACH TOWARD ENVIRONMENTAL STABILIZATION OF CHEMICAL AMPLIFICATION RESISTS

Gregory Breyta, Hiroshi Ito, William D. Hinsberg, 1993 .

Positive Resists Based on Non-polymeric Macromolecules

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005 .

Progress in 193nm Resists

Hiroshi Ito, Hoa D. Truong, Carl E. Larson, 2000 .

Direct measurement of the counterion distribution within swollen polyelectrolyte films.

Hiroshi Ito, Wen-Li Wu, Jack F Douglas, 2005, Langmuir : the ACS journal of surfaces and colloids.

Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base‐Developable Resist

Hiroshi Ito, Elizabeth Flores, Alfred F. Renaldo, 1988 .

Molecular recognition: from solution science to nano/materials technology.

Hiroshi Ito, Katsuhiko Ariga, Hiroshi Tsukube, 2012, Chemical Society reviews.

Radical copolymerization of 2‐trifluoromethylacrylic monomers. III. Kinetics and monomer reactivities in the copolymerization of t‐butyl 2‐trifluoromethylacrylate and methacrylate with styrene bearing hexafluoroisopropanol

Hiroshi Ito, Dolores C. Miller, Hiroshi Ito, 2004 .

Evolution and Progress of Deep UV Resist Materials

Hiroshi Ito, Hiroshi Ito, 1998 .

Monomer Reactivities and Kinetics in Radical Copolymerization of Hydroxystyrene Derivatives and tert-Butyl (Meth)acrylate

Hiroshi Ito, Andrew E. Pomerantz, R. Sooriyakumaran, 2000 .

Fabrication and Evaluation of TiN Micro-heater for MEMS Gas Sensor

Hiroshi Ito, Hiroshi Ito, Hiroyuki Nikkuni, 2018, IEEJ Transactions on Sensors and Micromachines.

Investigation of Deep UV Resists by NMR: Residual Casting Solvents, Chemistries, and PAG Decomposition in film

Hiroshi Ito, Mark Sherwood, 1999 .

Evaluation of Onium Salt Cationic Photoinitiators as Novel Dissolution Inhibitor for Novolac Resin

Hiroshi Ito, Elizabeth Flores, 1988 .

NEW OXYGEN PLASMA DEVELOPABLE UV SENSITIVE RESIST.

Hiroshi Ito, C. Grant Willson, Scott A. MacDonald, 1985 .

Study of application of ultrasonic wave to injection molding

Hiroshi Ito, Kiyohito Koyama, Atsushi Sato, 2009 .

Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography

Hiroshi Ito, Mitsuru Ueda, Alfred F. Renaldo, 1989 .

Advances in the design of organic resist materials

Hiroshi Ito, C. Grant Willson, Scott A. MacDonald, 1983 .

CHEMICAL AMPLIFICATION BASED ON ACID-CATALYZED DEPOLYMERIZATION

Hiroshi Ito, William P. England, Mitsuru Ueda, 1990 .

Chain scission efficiency and reactive-ion etch resistance of alternating copolymers of styrene and olefins trisubstituted or tetrasubstituted with electron-withdrawing groups

Hiroshi Ito, Hiroshi Ito, H. K. Hall, 1986 .

Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins

Hiroshi Ito, C. Grant Willson, C. Willson, 1983 .

Annealing concept for the design of environmentally stable chemical amplification resists.

Hiroshi Ito, R. Sooriyakumaran, Greg Breyta, 1995 .

Weak acid-strong base type charge-mosaic membrane. I. Carboxylic acid-quaternary amine system

Hiroshi Ito, Kazuhiro Hirahara, Hiroshi Ito, 1989 .

Poly[p-(formyloxy)styrene]: synthesis and radiation-induced decarbonylation

Hiroshi Ito, C. Grant Willson, Theodore G. Tessier, 1985 .

Micro- and Nanopatterning Polymers

Hiroshi Ito, Elsa Reichmanis, Omkaram Nalamasu, 1998 .

Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance

Hiroshi Ito, Hiroshi Ito, M. Ueda, 1989 .

Effects of Process Conditions on Surface Replication and Higher-Order Structure Formation in Micromolding

Hiroshi Ito, Takeshi Kikutani, Hiroshi Ito, 2007 .

Dissolution Kinetics and FAG Interaction of Phenolic Resins in Chemically Amplified Resists

Hiroshi Ito, Greg Breyta, Debra-Fenzel Alexander, 1997 .

Product Volatilization as a Probe of the Physics and Chemistry of Latent Image Formation in Chemically Amplified Resists

Hiroshi Ito, Martha I. Sanchez, William D. Hinsberg, 2002 .

One‐dimensional polymer nanofiber arrays with high aspect ratio obtained by thermal nanoimprint method

Hiroshi Ito, T. Kyotani, Hiroshi Ito, 2017 .

Microlithography・molecular imprinting

Hiroshi Ito, Hiroshi Ito, J. Marty, 2005 .

The “Living” Free Radical Synthesis of Poly(4-hydroxystyrene): Physical Properties and Dissolution Behavior

Hiroshi Ito, Roger F. Sinta, George G. Barclay, 1998 .

A Test for Correlation between Residual Solvent and Rates ofN-Methylpyrrolidone Absorption by Polymer Films

Hiroshi Ito, William D. Hinsberg, Scott A. MacDonald, 1993 .