Hung-Sen Chen

An evaluation of FUROX isolation technology for VLSI/nMOSFET fabrication

S.M. Chen, Ching-Yi Wu, H. Tsai, 1988 .

Junction and Device Characteristics of Gate-Last Ge p- and n-MOSFETs With ALD- $\hbox{Al}_{2}\hbox{O}_{3}$ Gate Dielectric

Chun-Yen Chang, G. Luo, C. Chien, 2009, IEEE Transactions on Electron Devices.

Junction and Device Characteristics of Gate-Last Ge p- and n-MOSFETs With ALD-Al 2 O 3

Chun-Yen Chang, G. Luo, Chao-Ching Cheng, 2009 .