Birgitt Hepp

Membrane filtration: a sustainable water treatment technology within modern papermaking concepts

Harry Futselaar, Henk Schonewille, Birgitt Hepp, 2005 .

Pushing the boundary: low-k1 extension by polarized illumination

Mark van de Kerkhof, Eelco van Setten, Wim de Boeij, 2007, SPIE Advanced Lithography.

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2009 .

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

A scatterometry-based CD uniformity control solution for Spacer Patterning Technology

Noelle Wright, Hugo Cramer, Jongsu Lee, 2012, Advanced Lithography.

Double patterning for 32nm and below: an update

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2008, SPIE Advanced Lithography.