Tomohiro Motono

Expanding DSA process window with atmospheric control

Masahiko Harumoto, Masaya Asai, Charlotte Bouet, 2020, Advanced Lithography.

Application of alternative developer solutions for EUV lithography

Masahiko Harumoto, Harold Stokes, Masaya Asai, 2020, Advanced Lithography.

High sensitivity non-CAR resists for EUV and EB lithography

Masahiko Harumoto, Masaya Asai, Kazuyo Morita, 2020, Advanced Lithography.

Alternative EUVL resist processes for stochastic defect reduction

Masahiko Harumoto, Harold Stokes, Masaya Asai, 2020, Photomask Technology.