Hiroyoshi Kubo

Development of a novel EUV mask protection engineering tool and mask handling techniques

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, 2007, Photomask Japan.

Path to the HVM in EUVL through the development and evaluation of the SFET

Hideki Morishima, Toshihiko Tsuji, Hiroyoshi Kubo, 2007, SPIE Advanced Lithography.

Development of EUV mask handling technology at MIRAI-Selete

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, 2007, SPIE Advanced Lithography.

On the design of ultra-precise aerostatic linear guideway.

Yuji Furukawa, Nobuyuki Moronuki, Hiroyoshi Kubo, 1989 .