Gerry Luk-Pat

Interactions of double patterning technology with wafer processing, OPC and design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2008, SPIE Advanced Lithography.

An investigation into scalability and compliance for triple patterning with stitches for metal 1 at the 14nm node

Christopher Cork, Alexander Miloslavsky, Gerry Luk-Pat, 2013, Advanced Lithography.

Double-patterning-friendly OPC

Kevin Lucas, Chris Cork, Xiaohai Li, 2009, Advanced Lithography.

Checking design conformance and optimizing manufacturability using automated double patterning decomposition

Vincent Wiaux, Mireille Maenhoudt, Staf Verhaegen, 2008, SPIE Advanced Lithography.

Triple patterning in 10nm node metal lithography

David Z. Pan, Kevin Lucas, Chris Cork, 2012 .