John Hapli

Interactions of double patterning technology with wafer processing, OPC and design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2008, SPIE Advanced Lithography.

Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2009 .

Large-scale double-patterning compliant layouts for DP engine and design rule development

Christopher Cork, Kevin Lucas, Levi D. Barnes, 2009, Advanced Lithography.