John Lewellen
发表
Vincent Wiaux,
Staf Verhaegen,
Kevin Lucas,
2008,
SPIE Advanced Lithography.
Vincent Wiaux,
Staf Verhaegen,
Kevin Lucas,
2009
.
David A. Lee,
Peter Brooker,
Tod Robinson,
2006,
SPIE Photomask Technology.
David A. Lee,
Ron Bozak,
Peter Brooker,
2006,
Photomask Japan.
Jacek K. Tyminski,
John Lewellen,
2004,
SPIE Advanced Lithography.
Thomas Schmoeller,
Wolfgang Demmerle,
Jacek K. Tyminski,
2009,
Photomask Japan.
Gary Zhang,
Simon Chang,
John Lewellen,
2006,
SPIE Advanced Lithography.
Young-Mog Ham,
Daniel Ritter,
Rand Cottle,
2005,
Photomask Japan.
David A. Lee,
Ron Bozak,
Peter Brooker,
2005,
Photomask Japan.