Chin-Chou K. Huang

High-order stitching overlay analysis for advanced process control

David Tien, Howard Chen, John C. Robinson, 2011, Advanced Lithography.

Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Philippe Thony, Elyakim Kassel, Marco Polli, 2005, SPIE Advanced Lithography.

Improved scanner matching using scanner fleet matcher (SFM)

David Tien, John C. Robinson, Chin-Lung Lee, 2010, Advanced Lithography.

Novel methods for stitching and overlay corrections

Chin-Chou K. Huang, Shengyuan Zhong, Jian Wang, 2021, Advanced Lithography.