Robert John Socha

发表

Will Conley, Cesar M. Garza, Mircea Dusa, 2001, SPIE Advanced Lithography.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I

Robert John Socha, John S. Petersen, J. Fung Chen, 1998, Photomask Technology.

Optical lithography in the sub-50-nm regime

Robert John Socha, Reiner Garreis, Donis G. Flagello, 2004, SPIE Advanced Lithography.

Effect of the partial coherence on reflective notching

Robert John Socha, Andrew R. Neureuther, Christopher J. Progler, 1997, Advanced Lithography.

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Freeform and SMO

Robert John Socha, 2011, Advanced Lithography.

Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction

Stephen Hsu, Robert John Socha, Ting Chen, 2005 .

Computational scanner wafer mark alignment

Robert John Socha, Christiane Jehoul, Philippe Leray, 2017, Advanced Lithography.

A proposal for the contact hole assist feature printing checker in IML

Jason Shieh, Alek C. Chen, Robert John Socha, 2005, Photomask Japan.

Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction

Andrew R. Neureuther, Konstantinos Adam, Robert John Socha, 1998, Photomask Technology.

Holistic method for reducing overlay error at the 5nm node and beyond

Robert John Socha, 2020 .

Rigorous electromagnetic simulation of stepper alignment

Thomas V. Pistor, Robert John Socha, 2002, SPIE Advanced Lithography.

Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches

Robert John Socha, Keeho Kim, Donis G. Flagello, 2002, SPIE Advanced Lithography.

Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Yuri Granik, Uwe Hollerbach, Robert John Socha, 2000 .

Line end shortening in CPL mask technology

Will Conley, Robert John Socha, Chris Progler, 2005 .

Modeling oblique incidence effects in photomasks

Thomas V. Pistor, Andrew R. Neureuther, Robert John Socha, 2000, Advanced Lithography.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Will Conley, Christophe Pierrat, Robert John Socha, 1999, Advanced Lithography.

Impact of EUV SRAF on Bossung tilt

Stephen Hsu, Patrick P. Naulleau, Robert John Socha, 2017, Advanced Lithography.

Improving scanner wafer alignment performance by target optimization

Sudhar Raghunathan, Philippe Leray, Robert John Socha, 2016, SPIE Advanced Lithography.

Understanding the impact of full-field mask error factor

Will Conley, Mircea Dusa, Robert John Socha, 2000, Advanced Lithography.

Everything you ever wanted to know about why the semiconductor industry needs a high-refractive index photoresist but were afraid to ask: Part I

Will Conley, Robert John Socha, 2006, SPIE Advanced Lithography.

Understanding illumination effects for control of optical proximity effects (OPE)

Yu Cao, Robert John Socha, Peng Liu, 2008, SPIE Advanced Lithography.

CD control comparison for sub-0.18-μm patterning using 248-nm lithography and strong resolution enhancement techniques

Geert Vandenberghe, Kurt G. Ronse, Robert John Socha, 1999, Advanced Lithography.

Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance

Robert John Socha, Keith Gronlund, Zhipan Li, 2009, Lithography Asia.

Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies

Tsann-Bim Chiou, Alek C. Chen, Robert John Socha, 2008, Lithography Asia.

Simulating photomask edge roughness and corner rounding

Konstantinos Adam, Thomas V. Pistor, Robert John Socha, 1997, Advanced Lithography.

Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation

Yuri Granik, Robert John Socha, Emile Sahouria, 2000, SPIE Advanced Lithography.

Through pitch contact hole imaging for the 65nm node

Will Conley, Robert John Socha, Lloyd C. Litt, 2006 .

22nm logic lithography in the presence of local interconnect

Michael C. Smayling, Robert John Socha, Mircea Dusa, 2010, Advanced Lithography.

Printability of phase-shift defects using a perturbational model

Andrew R. Neureuther, Robert John Socha, 1994, Photomask Technology.

Solutions for printing sub-100-nm contacts with ArF

Robert John Socha, Reiner Garreis, Donis G. Flagello, 2002, SPIE Advanced Lithography.

Understanding the forbidden pitch phenomenon and assist feature placement

Stephen Hsu, Mircea Dusa, Robert John Socha, 2002, SPIE Advanced Lithography.

Impact of optical thin film effects on CD control in DUV lithography

Robert John Socha, Sheila Vaidya, Raymond A. Cirelli, 1995, Advanced Lithography.

An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging

Robert John Socha, Keith Gronlund, Steve Hansen, 2008, Lithography Asia.

Development of a computational lithography roadmap

Yu Cao, Robert John Socha, J. Fung Chen, 2008, SPIE Advanced Lithography.

Effects of wafer topography on the formation of polysilicon gates

Zoran Krivokapic, Robert John Socha, Andrew R. Neureuther, 1995, Advanced Lithography.

Design compliant source mask optimization (SMO)

Robert John Socha, Tejas Jhaveri, Xiaofeng Liu, 2010, Photomask Japan.

The impact of MEEF through pitch for 120-nm contact holes

Will Conley, Kevin D. Lucas, Robert John Socha, 2004, SPIE Advanced Lithography.

Automatic pitch decomposition for improved process window when printing dense features at k1eff<0.20

Robert John Socha, Donis G. Flagello, Mircea Dusa, 2006, Photomask Japan.

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Jo Finders, Robert John Socha, 2002, SPIE Advanced Lithography.

Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Greg Yeric, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

Lithography process optimization for 130-nm polygate mask and the impact of mask error factor

Stephen Hsu, Robert John Socha, Xuelong Shi, 2001, SPIE Advanced Lithography.

Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Michael T. Reilly, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

Role of illumination and thin film layers on the printability of defects

Robert John Socha, Andrew R. Neureuther, A. Neureuther, 1995, Advanced Lithography.

Design of 200nm, 170nm, 140nm DUV contact sweeper high transmission attenuating phase shift mask through simulation. Part 1

Robert John Socha, Fung Chen, John S. Petersen, 1998 .

Analysis of sub-wavelength sized OPC features

Konstantinos Adam, Thomas V. Pistor, Robert John Socha, 1998 .