V. Law

A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas

A. Kenyon, D. C. Clary, V. Law, 1999 .

Harmonic monitoring of the switched silicon etched process

A. Kenyon, N. Thornhill, L. Lea, 2003 .

Harmonic characterisation of a plasma-tool using a diplexer

M. Cooke, V. Law, I. Batty, 1999 .

Optical Emission Analysis of Molecular Nitrogen by Using a Self-Resonating Dielectric Barrier Plasma Reactor

I. Boyd, A. Amry, V. Law, 2012 .

Amplitude and phase measurement of plasma harmonics in a photoresist etching process

Anthony J. Kenyon, Nina F. Thornhill, Vj Law, 2003 .