Bart Baudemprez
发表
Anne-Marie Goethals,
Eric Hendrickx,
Rik Jonckheere,
2009,
Advanced Lithography.
Sandip Halder,
Gian F. Lorusso,
Philippe Leray,
2016,
SPIE Advanced Lithography.
David Laidler,
Ivan Pollentier,
Youri van Dommelen,
2004,
SPIE Advanced Lithography.
Bart Baudemprez,
Sebastien Egret,
Tetsunari Furusho,
2004,
SPIE Advanced Lithography.
Ming Mao,
Philippe Leray,
Bart Baudemprez,
2015,
Advanced Lithography.
Anne-Marie Goethals,
Kurt G. Ronse,
Ivan Pollentier,
2008,
SPIE Advanced Lithography.
Andrew Cross,
Gregg Inderhees,
Rik Jonckheere,
2012,
Advanced Lithography.
Uwe Dietze,
Peter Dress,
Rik Jonckheere,
2012,
European Mask and Lithography Conference.
Gian Francesco Lorusso,
Frieda Van Roey,
Insung Kim,
2007,
SPIE Advanced Lithography.
Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Uwe Dietze,
Peter Dress,
Rik Jonckheere,
2011,
European Mask and Lithography Conference.
Gian F. Lorusso,
Philippe Leray,
Osamu Inoue,
2016,
SPIE Advanced Lithography.
Anne-Marie Goethals,
Gian F. Lorusso,
Jan Hermans,
2008
.