Yoichi Takahashi

发表

Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3‐dioxolan groups

N. Ogata, K. Sanui, K. Oguchi, 1990 .

Dimensions of poly(trimethylene oxide) chains in a theta-solvent

J. E. Mark, D. Chiu, Yoichi Takahashi, 1976 .

A polymer complex as a new type of electron beam resist for dry development

N. Ogata, K. Sanui, M. Watanabe, 1988 .

Quantitative analyses of high-resolution 3D MR images of highly myopic eyes to determine their shapes.

I. Morita, M. Tomita, Muka Moriyama, 2012, Investigative ophthalmology & visual science.

Relationship between electron sensitivity and chemical structures of polymers as electron beam resists. VI: Electron sensitivity of various acetalized poly(vinyl alcohol)s

N. Ogata, K. Sanui, K. Oguchi, 1989 .

Relationship between electron sensitivity and chemical structures of polymers as EB resists: Poly(lactam thioether) as new positive EB resists

N. Ogata, K. Sanui, K. Oguchi, 1986 .

Relationship between electron sensitivity and chemical structures of polymers as EB resists. II. Acetalized polyvinyl alcohol as new negative EB resists

N. Ogata, K. Sanui, K. Oguchi, 1983 .

Relationship between electron sensitivity and chemical structures of polymers as electron beam (EB) resists. V: Polyamides containing sulfur groups as positive eb resists

N. Ogata, K. Oguchi, Yoichi Takahashi, 1988 .

Relationship between electron sensitivity and chemical structure of polymers as EB resists. I. Electron sensitivity of various polyamides

N. Ogata, K. Sanui, Hozumi Tanaka, 1983 .

Thermoresponsive Microtextured Culture Surfaces Facilitate Fabrication of Capillary Networks

Masayuki Yamato, Teruo Okano, Akihiko Kikuchi, 2007 .