T. Nakada

发表

Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3‐dioxolan groups

N. Ogata, K. Sanui, K. Oguchi, 1990 .

Metalorganic chemical vapor deposition of ZnSe thin films on ITO/glass substrates

Y. Su, M. Yokoyama, C. Hsu, 1993 .

A polymer complex as a new type of electron beam resist for dry development

N. Ogata, K. Sanui, M. Watanabe, 1988 .

Relationship between electron sensitivity and chemical structures of polymers as electron beam resists. VI: Electron sensitivity of various acetalized poly(vinyl alcohol)s

N. Ogata, K. Sanui, K. Oguchi, 1989 .

Relationship between electron sensitivity and chemical structures of polymers as EB resists: Poly(lactam thioether) as new positive EB resists

N. Ogata, K. Sanui, K. Oguchi, 1986 .

Relationship between electron sensitivity and chemical structures of polymers as EB resists. II. Acetalized polyvinyl alcohol as new negative EB resists

N. Ogata, K. Sanui, K. Oguchi, 1983 .

Relationship between electron sensitivity and chemical structures of polymers as electron beam (EB) resists. V: Polyamides containing sulfur groups as positive eb resists

N. Ogata, K. Oguchi, Yoichi Takahashi, 1988 .

Relationship between electron sensitivity and chemical structure of polymers as EB resists. I. Electron sensitivity of various polyamides

N. Ogata, K. Sanui, Hozumi Tanaka, 1983 .