Guk-Jin Kim

发表

193nm inspection of extreme ultraviolet mask absorber defect

Chang-Moon Lim, Guk-Jin Kim, In-Seon Kim, 2014, Advanced Lithography.

Aerial image of mesh supported extreme ultraviolet pellicle

Eytan Barouch, Guk-Jin Kim, Michael Yeung, 2014, Advanced Lithography.

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2016 .

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Guk-Jin Kim, In-Seon Kim, Hye-Keun Oh, 2015, Advanced Lithography.

Effect of defects on extreme ultraviolet pellicle

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2014, Advanced Lithography.

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Michael Yeung, 2017 .

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Guk-Jin Kim, In-Seon Kim, Hye-Keun Oh, 2015 .

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, 2016 .

Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2017, Advanced Lithography.

Wrinkle formation analysis in extreme-ultraviolet pellicle

Guk-Jin Kim, Hye-Keun Oh, Sung-Gyu Lee, 2017, Photomask Technology.

Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, 2017, Advanced Lithography.

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2016, Photomask Technology.

Etched multilayer mask in EUV lithography for 16 nm node and below

Eytan Barouch, Guk-Jin Kim, Michael Yeung, 2014, Photomask and Next Generation Lithography Mask Technology.

Mobbing-Value Algorithm based on User Profile in Online Social Network

Guk-Jin Kim, Gun-Woo Park, Sang-Hoon Lee, 2009 .

CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Guk-Jin Kim, In-Seon Kim, Hye-Keun Oh, 2017, Advanced Lithography.

Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Guk-Jin Kim, Hye-Keun Oh, Su-Mi Hur, 2017, Photomask Technology.

Etched multilayer mask is better than conventional absorber mask

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2014, Photomask and Next Generation Lithography Mask Technology.

Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2016, SPIE Advanced Lithography.

Patterning dependence on the mask defect for extreme ultraviolet lithography

Eytan Barouch, Guk-Jin Kim, In-Seon Kim, 2015, Other Conferences.

Imaging performance of mesh supported pellicle for extreme ultraviolet lithography

Guk-Jin Kim, Hye-Keun Oh, Eytan Barouch, 2014 .

Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations

Guk-Jin Kim, In-Seon Kim, Hye-Keun Oh, 2017 .