Steven Holmes

Evaluation of double-patterning techniques for advanced logic nodes

Youri van Dommelen, Shinichiro Kawakami, Chiew-Seng Koay, 2010, Advanced Lithography.

Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes

Youri van Dommelen, Andrew Metz, Emil Schmitt-Weaver, 2009, Advanced Lithography.

Towards manufacturing of advanced logic devices by double-patterning

Scott Halle, Youri van Dommelen, Shinichiro Kawakami, 2011, Advanced Lithography.

Directed self-assembly process implementation in a 300mm pilot line environment

Joy Cheng, Mark Somervell, Hsinyu Tsai, 2013, Advanced Lithography.