Drew R. Russell

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Chong-Cheng Fu, John L. Sturtevant, Linard Karklin, 1999, Advanced Lithography.

Die-to-die and die-to-database capability analysis for advanced OPC inspection

Kevin D. Lucas, John Riddick, Franklin D. Kalk, 1999, Photomask Technology.