Wan-Shick Hong

发表

Si-nanocrystalline nonvolatile floating gate memory device based on Schottky Barrier Tunneling Transistor

Tae-Youb Kim, Jungho Kim, Eunkyeom Kim, 2007 .

Memory characteristics of MOS with doubly stacked silicon nanocrystals

Jeong-Ho Kim, Eunkyeom Kim, Moonsup Han, 2007 .

Silicon Nanocrystal Non-volatile Floating Gate Memory Devices By Using Schottky Barrier Source/Drain (S/D) Structure

Tae-Youb Kim, Jungho Kim, Eunkyeom Kim, 2008 .

Nonvolatile Memory Characteristics of Double-Stacked Si Nanocluster Floating Gate Transistor

Eunkyeom Kim, Kyoungwan Park, Jeongho Kim, 2008 .

Study of Low Temperature (180 oC) Dual-Select-Diode for Applications to Pixel Switching Devices for Flexible Displays

Sin-Young Kang, Wan-Shick Hong, Tae-Ho Song, 2013 .

Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application

Jang-Yeon Kwon, Takashi Noguchi, Wan-Shick Hong, 2006 .

High Transmittance TFT-LCD Panels Using Low- CVD Films

Kyuha Chung, Wan-Shick Hong, Joon-hoo Choi, 2004 .

Utilization of A-Si:H Switching Diodes for Signal Readout from A-Si:H Pixel Detectors

Victor Perez-Mendez, Hyoung-Koo Lee, Wan-Shick Hong, 1993 .

High transmittance TFT-LCD panels using low-/spl kappa/ CVD films

Kyuha Chung, Wan-Shick Hong, Joon-hoo Choi, 2004 .