Hsin-Chang Lee

发表

Characterization of charging-induced pattern positioning errors in advanced mask making

Chien-Cheng Chen, Chih-Cheng Lin, Anthony Yen, 2016 .

Global CD uniformity improvement in mask manufacturing for advanced lithography

John Lin, Wen-Chuan Wang, Ru-Gun Liu, 2003, SPIE Photomask Technology.

Mask-making study for the 65-nm node

Wen-Chi Chen, Chi-Lun Lu, Hsin-Chang Lee, 2003, SPIE Photomask Technology.

Improvement of etching selectivity for 32-nm node mask making

Wen-Chuan Wang, Chi-Lun Lu, Yao Ching Ku, 2007, Photomask Japan.

E-beam lithography experimental results and simulation for the 45-nm node

John Nistler, Hsin-Chang Lee, Hung-Chang Hsieh, 2004, SPIE Photomask Technology.

Auto-classification and simulation of mask defects using SEM and CAD images

Peter Fiekowsky, Hsin-Chang Lee, Tung-Yaw Kang, 2008, Photomask Technology.

Exploring the origin of charging-induced pattern positioning errors in mask making using e-beam lithography

Chien-Cheng Chen, Anthony Yen, Chih-Cheng Lin, 2015, SPIE Photomask Technology.

Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors

Burn Jeng Lin, Ta-Cheng Lien, Chia-Jen Chen, 2004, Photomask Japan.

Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake

Peter Dress, Hsin-Chang Lee, Hung-Chang Hsieh, 2003, SPIE Photomask Technology.

Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback

Peter Dress, Werner Saule, Hsin-Chang Lee, 2004, Photomask Japan.

Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making

Yao-Ching Ku, Tzu-Yi Wang, Chia-Jen Chen, 2007, Photomask Japan.

Global critical dimension uniformity improvement for mask fabrication with negative-tone chemically amplified resists by zone-controlled postexposure bake

Peter Dress, Hsin-Chang Lee, Hung-Chang Hsieh, 2004 .

Global CD uniformity improvement using dose modulation pattern correction of pattern density-dependent and position-dependent errors

Ta-Cheng Lien, Hsin-Chang Lee, Hung-Chang Hsieh, 2004, 2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846).