Mahito Sawada

A Novel STI Process from the View Point of Total Strain Process Design for 45nm Node Devices and Beyond

Yuzuru Ohji, Kiyoteru Kobayashi, Masato Ishibashi, 2004 .

Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45 nm Node Devices and Beyond

Y. Ohji, M. Inuishi, T. Kuroi, 2005 .