J. J. MacFarlane

Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography

I. E. Golovkin, P. R. Woodruff, S. S. Harilal, 2008, SPIE Advanced Lithography.

Modeling radiative transport in ICF plasmas on an IBM SP2 supercomputer

G. A. Moses, J. J. MacFarlane, J. A. Johansen, 1995 .

Radiation-hydrodynamics, spectral, and atomic physics modeling of laser-produced plasma EUVL light sources

I. E. Golovkin, P. R. Woodruff, J. J. MacFarlane, 2005, SPIE Advanced Lithography.

Optimization of EUV/SXR plasma radiation source characteristics

I. E. Golovkin, P. R. Woodruff, J. J. MacFarlane, 2006, SPIE Advanced Lithography.

VISRAD—A 3-D view factor code and design tool for high-energy density physics experiments

J. J. MacFarlane, 2003 .

Visrad, 3-D target design and radiation simulation code

I. E. Golovkin, J. J. MacFarlane, S. Kulkarni, 2014, 2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS).